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Response to Revised development times for Kodak films at new plant

from Michael Feldman (mfeldman@qwest.net)
The development time for TMAX-100 decreased 25% and the time for Plus- X increased about 20%. There is nothing in the announcement about scratch resistance. There is some mention about the new film being "much less susceptible to attracting dust," but it doesn't say if this only occurs during the new manufacturing process, after manufacture but before the film is developed, or after development (or some combination of the above).

The announcement claims only "slight adjustment in development times." If the new published times are accurate (relative to the old times, not relative to our personal times) then I don't consider 25% to be slight. Interestingly, TMAX-400 development times did not change at all.

http://www.kodak.com/country/US/en/corp/pressReleases/pr20020224- 01.shtml (remove embedded blanks if necessary)

(posted 8208 days ago)

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